Aiming at the urgent need of high-performance transparent electromagnetic shielding material for electromagnetic protection of photoelectric system at present, some disadvantages of traditional transparent electromagnetic shielding materials are first analyzed. The research status of new transparent electromagnetic shielding materials, including continuous and aperture films, is further reviewed from the aspects of characteristics, performance and preparation methods. The mutual restriction between light transmittance and shielding performance of transparent electromagnetic shielding materials and its solutions are discussed, and the effective ways to realize ultra-wideband and highly transparent electromagnetic shielding materials by optimizing the combination of different types of materials are introduced at the same time. It is expected that this review will contribute to the development of high-performance electromagnetic shielding materials.

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